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  FineCreator

FineCreator


FPD/fine-pattern design environment that greatly reduces Turnaround Time for design

Key function

Handling of large and complex data

  • Universally compatible binary database that can be used, as is, with both Windows and UNIX.

Excellent user interface

  • Windows-like operability
  • Excellent operability which is fully optimized for keyboard, mouse and tablet operation
  • Multi language menus (Japanese and English modes)

Advanced editor

  • Rule drive/Net driven design which reduce design mistakes
  • Enable net driven editing from existing polygon data
  • Push aside function which keeps design rule between polygon data

Perfect pattern editing commands

  • Greatly reduce editing time by automatic router keeping consistent resistance, bus function, trim function.
  • Reduce verification time by various verification tool which is specialized as FPD design.

Input of a wide variety of document information

  • Dimension lines and schematic frames

Interactive conversion

  • STREAM/DXF/IGES/GERBER(Laser,Fixed)

Support simultaneous optimization both pixel structure and driver circuit.

  • Combine circuit analysis and optical analysis
Alpha-SX Custom Design Platform
α-SX Custom Design Platform
Key function of FineCreator
Supported platforms
•Windows2000/XP •Sun/Solaris 8,9,10
•Red Hat Linux7.3/9
•Red Hat Enterprise Linux WS release 3,4,5.2
•Sun/Solaris X86 •SUSE Linux


Application design fields

•FPD
(TN/STN/a-TFT/LTPS/HTPS/PDP/OLED/electronic paper...)
•All fine-pattern design fields (such as Color-filters,magnetic heads,BGA,TAB,LeadFrames,light gides,sensors, and thermal heads)
FineArts Fine-pattern design package
•Generation of special-figure patterns
(arched ellipses, cams, convolutions, 8-segments figures)
•Additional-line input
•Bundling and trimming
•Automatic equivalent resistance routing
•Wiring resistance adjustment
•Surface generation
•Reports (resistance, area calculation, etc.)
•Schematic frame placement and dimension-line input
•Comment input


FineLVL Layout vs. Layout checker FineERC Short and floating checks
The layout pattern between two cells is comparing verified. Comparing only the difference figures of hierarchical cell enables very high-speed performance. High speed verification of short and floating between polygon figures which are not associated with connectivity information.
figure3 figure4


FineAcres High accuracy resistance calculator FineQap 3Dimensional capacitance extractor
•The interconnect resistance of the complex shape composed of any-angle and the arc can be calculated in high-speed and high accuracy. This product is using the finite difference method algorithm.
•Supporting multi layer wiring
•Analysis of resistance distribution by multipoint sequential measurements function
•Extract 3D parasitic capacitance by boundary element method and 3D capacitance extractor engine.
•Parasitic extraction for interconnect of large size drawing and high aspect ratio panel
•Easy generation of extracting model from layout data and cross section parameter
•Support both any angle wire and multiple layer wire
figure5 figure6


FineGFP Glass floor planning FineRFP Reticle desing and verification
Greatly reduce the trade off time for the best selection of multiple surfaces configuration.
•Generation of glass board design from base shot data, reticle(mask), generation parameters.
 Report the number of shots and reticle information Generat Glass substrate cells and reticle cells
•Shot cells design function which are placed on reticle.(Large size panel)
Divides the panel design into reticle patterns
Places patch patterns on the division line
Reports reticle informations, the shot and the alignment mark coordinate
figure7 figure8

FineCFC Design the color filter
Design color filter substrate parametrically
•Place alignment layer elements, transparent electrode elements, photo spacer elements and seal elements
•Support both color filter panel and color filter substrate designing
  figure9
FineFPC Design around FPC and COG
•Generation of cells for IC and FPC and build connectivity information between those cells by using port information(CSV format)
•Calculate wire width which resistance value matches to the rule file(CSV format) and verify the resultant resistance value.
•Footprint wiring capability which bundles multiple same net ports.
•High accuracy interconnect resistance calculation linked with 3D extractor FineAcres.
figure10

FPD panel Circuit design & Optical simulation design environment

Schematic Entry
Schematic entry which corresponds to layout design, LVS verification and circuit simulation etc.
•Support of 2D array instance for pixel array structure definition
•Parametric modeling for parasitic effect of interconnect
•Power mesh model definition for IR drop analysis
•Back annotation of interconnect parasitic information from FineAcres and FineQap.
figure1 figure2


Panel circuit simulation I/F
Analysis of accumulated Pixel capacitance
•3D RC extractor for Pixel device *1
•Circuit simulation with 3D interconnect parasitic effect
•N e t l i s t   r e d u c t i o n   o f   a r r a y structure circuit (WLModeler)
•Simulation of driver circuit with the load depends on panel size
figure11 figure12
*1:Use ExperLCD


SimfaceLCD Simulation I/F for pixel device characteristic
Trade off design using dynamic optical analysis with liquid crystal molecule behavior.
•Generate a table circuit model of the LC that consist of voltage dependent capacitance and dynamic characteristics of LC.
•Transient optical simulation with simulated wave forms. *2
•Concurrent simulation with circuit simulator and LC numerical solver.(Under development)
•Usable of existing circuit simulator model
figure13
*2:Use ExperLCD


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